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High-Speed Deposition of Y–Si–O Films by Laser Chemical Vapor Deposition Using Nd:YAG laser
A. Ito, J. Endo, T. Kimura, T. Goto
Surface and Coatings Technology 204(23) 3846–3850 (2010).
Y2O3
SiO2
Y-Si-O
CVD
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Accepted manuscript in self-archive
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To be archived
Submitted manuscript
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