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Laser chemical vapor deposition of TiN film on Ti(C, N)-based cermet substrate using Ti(O
i
Pr)
2
(dpm)
2
–NH
3
system
Y. You, A. Ito, R. Tu, T. Goto
Journal of the Ceramic Society of Japan 199(4) 310–313 (2011).
TiN
CVD
[Open Access]
Versions of the article
Final form in publisher
Available
as open access
Accepted manuscript in self-archive
Not available
due to the publisher's policy; however, the final form is freely available to read at publisher's site.
Submitted manuscript
Not available
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