Deposition of α-Al2O3 films on Ti(C, N)-based cermet substrate by laser chemical vapor deposition using a diode laser

Deposition of α-Al₂O₃ films on Ti(C, N)-based cermet substrate by laser chemical vapor deposition using a diode laser

Journal of the Ceramic Society of Japan 119(7) 570–572 (2011).

Available as open access

Not available due to the publisher's policy; however, the final form is freely available to read at publisher's site.

Not available

Back to full list